EUV
This week ASML is making two very important announcements related to their progress with high numerical aperature extreme ultraviolet lithography (High-NA EUV). First up, the company's High-NA EUV prototype system at its fab in Veldhoven, the Netherlands, has printed the first 10nm patterns, which is a major milestone for ASML and their next-gen tools. Second, the company has also revealed that it's second High-NA EUV system is now out the door as well, and has been shipped to an unnamed customer. "Our High-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines," a statement by ASML reads. "Imaging was done after optics, sensors and stages completed coarse calibration. Next up: bringing the system to full performance. And achieving the same results in the...
Samsung and TSMC Roadmaps: 8 and 6 nm Added, Looking at 22ULP and 12FFC
Samsung and TSMC have made several important announcements about the present and future of their semiconductor manufacturing technologies in March. Samsung revealed that it had shipped over 70 thousand...
89 by Anton Shilov on 5/5/2017
GlobalFoundries to Expand Capacities, Build a Fab in China
GlobalFoundries has announced plans to expand manufacturing capacities for its leading edge and mainstream production technologies in the U.S., Germany and Singapore. After the upgrades of the fabs are...
49 by Anton Shilov on 2/11/2017
Intel to Equip Fab 42 for 7 nm
Intel this week announced plans to bring its Fab 42 online to produce semiconductors using a 7 nm fabrication process. It will take three to four years, and the...
24 by Anton Shilov on 2/9/2017
GlobalFoundries Updates Roadmap: 7 nm in 2H 2018, EUV Sooner Than Later?
GlobalFoundries recently announced the first details about its next generation 7 nm manufacturing technology, which is being developed in-house, and revealed plans to start production of chips using the...
76 by Anton Shilov on 10/3/2016
Intel’s ‘Tick-Tock’ Seemingly Dead, Becomes ‘Process-Architecture-Optimization’
As reported at The Motley Fool, Intel’s latest 10-K / annual report filing would seem to suggest that the ‘Tick-Tock’ strategy of introducing a new lithographic process note in...
98 by Ian Cutress on 3/22/2016
EUV Lithography Makes Good Progress, Still Not Ready for Prime Time
At the recent annual SPIE Advanced Lithography conference, Intel, TSMC and other leading semiconductor companies said that significant strides have been made in extreme ultraviolet lithography (EUVL) over the...
38 by Anton Shilov on 3/10/2016
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